1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Submicrometer Hall devices fabricated by focused electron-beam-induced deposition
Rent:
Rent this article for
USD
10.1063/1.1856134
/content/aip/journal/apl/86/4/10.1063/1.1856134
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/4/10.1063/1.1856134
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic cross section and top view (not to scale) of the realized devices. The magnetic induction is applied: (b) out-of-plane, (c) in-plane at 45°.

Image of FIG. 2.
FIG. 2.

SEM images: (a) complete device, (b) “open” device. AFM images (intensity scale ): (c) complete device, (d) “open” device.

Image of FIG. 3.
FIG. 3.

Hall voltage as a function of the out-of-plane magnetic induction.

Image of FIG. 4.
FIG. 4.

Magnetic field resolution as a function of frequency.

Image of FIG. 5.
FIG. 5.

Hall voltage as a function of the in-plane magnetic induction. Only a few devices show this behavior.

Loading

Article metrics loading...

/content/aip/journal/apl/86/4/10.1063/1.1856134
2005-01-19
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Submicrometer Hall devices fabricated by focused electron-beam-induced deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/4/10.1063/1.1856134
10.1063/1.1856134
SEARCH_EXPAND_ITEM