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Patterning of hydrogenated microcrystalline silicon growth by magnetic field
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10.1063/1.1984102
/content/aip/journal/apl/87/1/10.1063/1.1984102
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/1/10.1063/1.1984102
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Deposition with the permanent magnet (M) placed under the substrate (S) with poles oriented either parallel (a) or perpendicular (b) to the substrate surface. Discharge was excited between heated bottom and very high-frequency powered top electrodes.

Image of FIG. 2.
FIG. 2.

Pattern of growth formed by the magnet oriented parallel to the glass substrate, illustrated in the top by AFM surface morphology at selected positions measured from the center of the magnet. rms roughness obtained from the AFM is plotted in the bottom graph (엯) together with crystallinity (∎) measured by micro-Raman spectroscopy.

Image of FIG. 3.
FIG. 3.

Pattern of microcrystalline growth formed by the magnet oriented perpendicular to the glass substrate. Elements of the figure have the same meaning as in Fig. 2.

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/content/aip/journal/apl/87/1/10.1063/1.1984102
2005-06-27
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterning of hydrogenated microcrystalline silicon growth by magnetic field
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/1/10.1063/1.1984102
10.1063/1.1984102
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