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Top view of LED samples after the patterned LLO process. Samples shown in the upper left image are with a pitch of and a chip size of . The SEM image details the surface of a VM-LED after the patterned LLO process.
Schematic diagram of the fabricated device structures: (a) the VM-LED with electroplating nickel substrate and (b) regular LED with the same epilayer structure and die size.
Comparison of the measured characteristics of VM-LED and regular LED.
Comparison of the measured -I characteristics of VM-LEDs and regular LEDs. The inset shows the typical picture of light emission from the VM-LED at 20 mA.
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