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Effects of the oxygen precursor on the electrical and structural properties of films grown by atomic layer deposition on Ge
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10.1063/1.2042631
/content/aip/journal/apl/87/11/10.1063/1.2042631
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/11/10.1063/1.2042631
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/content/aip/journal/apl/87/11/10.1063/1.2042631
2005-09-09
2014-08-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of the oxygen precursor on the electrical and structural properties of HfO2 films grown by atomic layer deposition on Ge
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/11/10.1063/1.2042631
10.1063/1.2042631
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