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Integrating yttrium iron garnet onto nongarnet substrates with faster deposition rates and high reliability
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10.1063/1.2046733
/content/aip/journal/apl/87/12/10.1063/1.2046733
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/12/10.1063/1.2046733
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Normalized x-ray diffraction peak heights vs atomic composition for as-deposited films fabricated using conventional reactive sputtering. The lines indicate XRD peaks found within individual samples (a) before postannealing, (b) after annealing with a conventional furnace at for in air.

Image of FIG. 2.
FIG. 2.

XRD patterns of films made using a partial pressure differential and using RTA at varying temperatures and time. (a) Affect of varying temperature with anneals on MgO substrates. (b) Affect of varying time at on quartz substrates. The data are graphed with the same scale.

Image of FIG. 3.
FIG. 3.

Gas flow rate ratio vs sputtering bias voltage ratios. All films were deposited with a partial pressure differential, and they were annealed at for in .

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/content/aip/journal/apl/87/12/10.1063/1.2046733
2005-09-15
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Integrating yttrium iron garnet onto nongarnet substrates with faster deposition rates and high reliability
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/12/10.1063/1.2046733
10.1063/1.2046733
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