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In situ infrared spectroscopy of hafnium oxide growth on hydrogen-terminated silicon surfaces by atomic layer deposition
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10.1063/1.2058226
/content/aip/journal/apl/87/13/10.1063/1.2058226
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/13/10.1063/1.2058226
/content/aip/journal/apl/87/13/10.1063/1.2058226
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/content/aip/journal/apl/87/13/10.1063/1.2058226
2005-09-20
2015-05-05
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ infrared spectroscopy of hafnium oxide growth on hydrogen-terminated silicon surfaces by atomic layer deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/13/10.1063/1.2058226
10.1063/1.2058226
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