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Postfabrication fine-tuning of photonic crystal microcavities in quantum dot membranes
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10.1063/1.2099516
/content/aip/journal/apl/87/15/10.1063/1.2099516
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/15/10.1063/1.2099516
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of a photonic crystal microcavity employing a site-selected quantum dot positioned at the defect site. The inset is an SEM image of an InP pyramidal nanotemplate.

Image of FIG. 2.
FIG. 2.

(Color online) (a) An SEM image of a 19-ring hexagonal crystal defect cavity. (b) Electric field amplitude of the (right panel) and (left panel) dipolelike modes.

Image of FIG. 3.
FIG. 3.

PL spectra from a single missing air-hole defect cavity for successive oxidation/etching cycles.

Image of FIG. 4.
FIG. 4.

Blueshift of the mode energies (upper panel) and values (lower panel) of the two dipole modes with repeated oxidation and etching. Dotted lines are FDTD simulations assuming an increase in of . The solid line in the upper panel is calculated assuming both an increase in of and a decrease in of .

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/content/aip/journal/apl/87/15/10.1063/1.2099516
2005-10-04
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Postfabrication fine-tuning of photonic crystal microcavities in InAs∕InP quantum dot membranes
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/15/10.1063/1.2099516
10.1063/1.2099516
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