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Self-fabrication of void array in fused silica by femtosecond laser processing
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View: Figures


Image of FIG. 1.
FIG. 1.

Laser microscope images of some types of voids fabricated by different number of pulses. The number of the focusing pulses is: (a) 1, (b) 2, (c) 4, and (d) 8. The laser was incident from the bottom side of these figures and the depth from the sample surface is . (e) and (f) show the top views of the sample after ten successive pulses irradiation when focusing beneath the sample.

Image of FIG. 2.
FIG. 2.

SEM images of a void fabricated by a single pulse in (a) and a void array by ten successive pulses in (b)–(d). The NA is 0.90 and the single-laser pulse is focused beneath the sample in (a). In (b)–(d), the NA is 0.75 and the ten successive pulses are focused beneath the sample surface, in which the void interval is .

Image of FIG. 3.
FIG. 3.

Laser microscope images of voids at the depths of: (a) and (b) from the sample surface. Three voids are shown in each figure. Each column (void) was fabricated by a single pulse. The incident beam condition is the same as Fig. 1.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-fabrication of void array in fused silica by femtosecond laser processing