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(a) Normalized -edge NEXAFS spectra of FCVA ta-C:H:Si films and a graphite sample. The inset presents the difference curves between the spectra of the ta-C and ta-C:H:Si films.
Normalized -edge NEXAFS spectra of RTA ta-C and ta-C:H:Si ( Si) films.
Angular dependence of the normalized NEXAFS spectra of ta-C:H:Si sample ( Si) at the edge. The right inset shows the angular dependence of the normalized and absorption peaks areas, and the left inset shows a schematic of the incidence angle .
(a) X-ray specular reflection profiles of pure and Si-incorporated ( Si) ta-C films illustrating the experimental and a model fit curves. (b) Evolution of mass density of ta-C:Si:H films with Si content.
The evolution of (a) normalized peak ratio and (b) Young’s modulus and hardness of the ta-C:H:Si films with Si concentration.
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