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(Color) Current vs bias voltage during the feedback-controlled electromigration of an Au wire at . Part A is a smooth curve indicating than the EM has not begun, whereas in Part B the resistance of the line increases irreversibly due to EM. Both Parts A and B are recorded in a single voltage biasing process, producing a final resistance of . At this point, the voltage was reduced to zero for some time. When the bias process was restarted in C, the wire resistance is the same, demonstrating that the EM process may be frozen by turning off the voltage. The inset shows the SEM micrograph of one of our devices. The scale bar in the inset is 2 micrometers long. Arrows indicate the progression of the curve.
Power dissipated in the junction vs the voltage drop at the junction . The irreversible change in resistance due to EM starts at the point labeled (a). Inset shows the corresponding current vs bias voltage data. The starting nanowire has dimensions ; the length and width of the nanowire is determined using SEM, and thickness by quartz crystal monitor during gold film deposition.
Power dissipated in the junction during electromigration vs nanowire cross-sectional area. The power is the average power in the region of near-constant power seen in Fig. 2.
(Color) Current vs bias voltage during the EM of three similar gold wires at . For the blue and red curves, the external feedback is turned off at the points marked by the blue and red arrows respectively. For the black curve, no external feedback was used.
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