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Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
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10.1063/1.2150250
/content/aip/journal/apl/87/26/10.1063/1.2150250
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/26/10.1063/1.2150250
/content/aip/journal/apl/87/26/10.1063/1.2150250
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/content/aip/journal/apl/87/26/10.1063/1.2150250
2005-12-19
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/26/10.1063/1.2150250
10.1063/1.2150250
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