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Electrochemical preparation of a stable accumulation layer on Si: A synchrotron radiation photoelectron spectroscopy study
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10.1063/1.2150267
/content/aip/journal/apl/87/26/10.1063/1.2150267
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/26/10.1063/1.2150267
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic drawing of electrochemical vessel connected to the UHV surface analysis system. Picture presented setup for electrochemical preparation with silicon sample as working electrode, the cylindrical platinum counterelectrode and capillary with the reference electrode. The capillary also act as entry point for electrolyte. The silicon sample is mounted on the metal holder by forming an ohmic contact. For simplification reasons, drawing does not include nozzles for rinsing and blowing.

Image of FIG. 2.
FIG. 2.

Current density and applied potential vs time curves for FZ in NaOH solution; open-circuit potential (SCE); inset: Current vs potential representation corresponding to the large figure; scan velocity .

Image of FIG. 3.
FIG. 3.

lines obtained in SRPES experiment for excitation energy and , corresponding to and escape depth, respectively. Dots: Original data, solid lines: Si bulk signal obtained after deconvolution.

Image of FIG. 4.
FIG. 4.

X-ray photoelectron spectroscopy valence-band onset obtained for excitation energy. The onset is located below the Fermi level.

Image of FIG. 5.
FIG. 5.

Energy band diagram of for (a) flat-band situation and (b) the electronic surface condition after electrochemical conditioning.

Image of FIG. 6.
FIG. 6.

Calculated electrostatic potential as a function of the distance from the surface according to the Thomas-Fermi theory for three electron concentrations (, , and ). Also marked are the escape depths corresponding to the two applied excitation energies.

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/content/aip/journal/apl/87/26/10.1063/1.2150267
2005-12-19
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrochemical preparation of a stable accumulation layer on Si: A synchrotron radiation photoelectron spectroscopy study
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/26/10.1063/1.2150267
10.1063/1.2150267
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