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Highly ordered self-organized dot patterns on Si surfaces by low-energy ion-beam erosion
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10.1063/1.2000342
/content/aip/journal/apl/87/3/10.1063/1.2000342
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/3/10.1063/1.2000342
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

AFM images of ion-beam eroded Si surfaces (, ) at different ion-incidence angles and ion energies. (a, b) , erosion time , and 75°, respectively. (c, d) , erosion time , and 75°, respectively. The image size is . Note the deviating (vertical) scale.

Image of FIG. 2.
FIG. 2.

Self-organized Si nanodots produced by ion beam erosion with , , , , erosion time . (a) AFM image. (b) Fourier spectrum of the AFM image indicating the higher order peaks (image range from ). (c) Angular averaged PSD function calculated from the AFM image. The position and width of the first peak translates into a mean dot separation∕size of and an average domain size of , respectively. (d) Cross-sectional HRTEM image of dot-shaped nanostructures showing an amorphous capping layer of thickness and the single-crystalline interior of the dots.

Image of FIG. 3.
FIG. 3.

Evolution of the mean dot size (solid symbols) and system correlation length (open symbols) with erosion time (, , , ).

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/content/aip/journal/apl/87/3/10.1063/1.2000342
2005-07-13
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Highly ordered self-organized dot patterns on Si surfaces by low-energy ion-beam erosion
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/3/10.1063/1.2000342
10.1063/1.2000342
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