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Atomic-layer-deposited dielectrics for metal-insulator-metal capacitor applications
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10.1063/1.2005397
/content/aip/journal/apl/87/5/10.1063/1.2005397
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/5/10.1063/1.2005397
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic diagram of the test structure of MIM capacitor; (b) TEM image of the MIM capacitor with individual barrier; (c) frequency-dependent dielectric constant and dissipation factor for all the dielectrics with a thickness of individual barrier from zero to .

Image of FIG. 2.
FIG. 2.

(a) Plot of normalized capacitance vs dc bias, together with the fitted curves (the solid lines) and the extracted and (ppm∕V) values at ; (b) dependence of on frequency for all the dielectrics.

Image of FIG. 3.
FIG. 3.

Typical leakage current density as a function of electric field at for the MIM capacitors with various dielectrics, the inset shows time-to-breakdown characteristics of all the dielectrics under the same electric field stress of .

Image of FIG. 4.
FIG. 4.

(a) Plots of vs for the capacitors with various dielectrics at room temperature, the inset shows a linear fitting corresponding to the MIM capacitor; (b) representative plots of vs at 0.7 and for the samples without and with individual barriers.

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/content/aip/journal/apl/87/5/10.1063/1.2005397
2005-07-25
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic-layer-deposited Al2O3–HfO2–Al2O3 dielectrics for metal-insulator-metal capacitor applications
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/5/10.1063/1.2005397
10.1063/1.2005397
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