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Metalorganic chemical vapor deposition of atomically flat films on stepped substrates
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10.1063/1.2006989
/content/aip/journal/apl/87/5/10.1063/1.2006989
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/5/10.1063/1.2006989
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) ratio and (b) resistivity of film as function of input gas flow rate of Ru, . The dotted line and open circles in (b) indicate the resistivity of single crystal (Ref. 9) and experimental data, respectively.

Image of FIG. 2.
FIG. 2.

XRD patterns of films deposited on polished substrates at . range; (a)–(d): 20°–50°, (e)–(h): 44°–48°, ; (a)(e); , (b)(f); , (c)(e); , (c)(e); .

Image of FIG. 3.
FIG. 3.

Surface roughness of films as a function of for films deposited on polished substrates at .

Image of FIG. 4.
FIG. 4.

XRD patterns of films deposited on (a) polished- and (b) stepped- substrates under of .

Image of FIG. 5.
FIG. 5.

SPM images of the films on (a), (c) polished- and (b),(d) stepped- substrates. (a),(b)—plane views of scans and (c), (d) are cross sections at A-B and C-D lines in (a) and (b), respectively.

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/content/aip/journal/apl/87/5/10.1063/1.2006989
2005-07-28
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metalorganic chemical vapor deposition of atomically flat SrRuO3 films on stepped SrTiO3 substrates
http://aip.metastore.ingenta.com/content/aip/journal/apl/87/5/10.1063/1.2006989
10.1063/1.2006989
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