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(a) ratio and (b) resistivity of film as function of input gas flow rate of Ru, . The dotted line and open circles in (b) indicate the resistivity of single crystal (Ref. 9) and experimental data, respectively.
XRD patterns of films deposited on polished substrates at . range; (a)–(d): 20°–50°, (e)–(h): 44°–48°, ; (a)(e); , (b)(f); , (c)(e); , (c)(e); .
Surface roughness of films as a function of for films deposited on polished substrates at .
XRD patterns of films deposited on (a) polished- and (b) stepped- substrates under of .
SPM images of the films on (a), (c) polished- and (b),(d) stepped- substrates. (a),(b)—plane views of scans and (c), (d) are cross sections at A-B and C-D lines in (a) and (b), respectively.
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