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Optical phase image contrast micrograph of the graphitized device, showing the four quadrants with electrode spacings of 5, 10, 20, and .
Pulsed x-ray photocurrent from Device 1, fabricated using metallized contacts.
Pulsed x-ray photocurrent from Device 2, fabricated using graphitized contacts.
X-ray sensitivity for Device 2, measured at 300 V bias.
Comparison of x-ray photocurrent ( beam current) obtained from Device 2 under illuminated and dark conditions.
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