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Thermal stability of a interface
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10.1063/1.2182023
/content/aip/journal/apl/88/10/10.1063/1.2182023
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/10/10.1063/1.2182023

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional HAADF-STEM images of samples: (a) without annealing, and (b) with annealing. (c) Image intensity distribution along line in (a). Intensity of Si atomic dumbbell was smaller at interface (denoted by arrow).

Image of FIG. 2.
FIG. 2.

Integrated intensity distribution in sample (a) without annealing and (b) with annealing. Solid circles represent measured intensities, and solid lines represent fitted Gaussian curves.

Tables

Generic image for table
Table I.

Values of and in Gaussian curves [Eq. (2)] fitted to measured intensity distribution.

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/content/aip/journal/apl/88/10/10.1063/1.2182023
2006-03-08
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermal stability of a HfO2∕SiO2 interface
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/10/10.1063/1.2182023
10.1063/1.2182023
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