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Reactive metal contact at indium–tin–oxide/self-assembled monolayer interfaces
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10.1063/1.2183371
/content/aip/journal/apl/88/10/10.1063/1.2183371
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/10/10.1063/1.2183371
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

integral intensity as a function of ITO coverage.

Image of FIG. 2.
FIG. 2.

XPS spectra of the reactive metal contacts: (a) the levels of the Cl-terminated monolayer, and (b) the levels of the -terminated monolayer, with deposited ITO and without ITO.

Image of FIG. 3.
FIG. 3.

SEM images of the ITO films (thickness ) grown on: (a) Cl-terminated, (b) -terminated, and (c) -terminated monolayers.

Image of FIG. 4.
FIG. 4.

(a) Typical current-voltage characteristics measured between the TLM pads with a spacing of and (b) plots of the measured total resistance versus the spacings (d) between the TLM pads.

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/content/aip/journal/apl/88/10/10.1063/1.2183371
2006-03-08
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reactive metal contact at indium–tin–oxide/self-assembled monolayer interfaces
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/10/10.1063/1.2183371
10.1063/1.2183371
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