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Patterning of silica microsphere monolayers with focused femtosecond laser pulses
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View: Figures


Image of FIG. 1.
FIG. 1.

(Color online) Geometry of the interaction between a focused beam and a microsphere.

Image of FIG. 2.
FIG. 2.

(Color online) Interaction of focused beam with microsphere calculated using a Generalized Lorentz-Mie scattering method. Internal and external near fields for a diameter sphere and a Gaussian beam (beam waist , wavelength ); (a) centered beam (, ); (b) laterally shifted beam ( and ). Variation of internal enhancement factor with (c) lateral shift and (d) axial shift.

Image of FIG. 3.
FIG. 3.

(Color online) Scheme of the setup for pulse delivery, imaging, and ranging of the sample.

Image of FIG. 4.
FIG. 4.

Threshold pulse energy for removal of an isolated sphere as a function of the focus axial position. The laser pulse was centered and its waist position scanned along the axis (repetition rate , ). The threshold energy is defined as the pulse energy, at repetition rate, required to eject an isolated sphere.

Image of FIG. 5.
FIG. 5.

(Color online) (a) Scanning electron microscope image of patterned monolayer silica-sphere lattice on borosilicate glass substrate. (b) Detail showing pit in substrate and debris from ablated sphere.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Patterning of silica microsphere monolayers with focused femtosecond laser pulses