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Angular dependence of silicon oxide etching yield in fluorocarbon chemistries
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10.1063/1.2190465
/content/aip/journal/apl/88/13/10.1063/1.2190465
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/13/10.1063/1.2190465
/content/aip/journal/apl/88/13/10.1063/1.2190465
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/content/aip/journal/apl/88/13/10.1063/1.2190465
2006-03-29
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Angular dependence of silicon oxide etching yield in fluorocarbon chemistries
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/13/10.1063/1.2190465
10.1063/1.2190465
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