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Measuring the role of surface chemistry in silicon microphotonics
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Image of FIG. 1.
FIG. 1.

(Color online) (a) SEM micrograph of a radius SOI microdisk. (b) Zoomed-in representation of disk edge (white dashed box) showing a surface-sensitive TM polarized whispering gallery mode solved via FEM.

Image of FIG. 2.
FIG. 2.

(Color online) Normalized spectral transmission response of Si microdisk resonators. (a) Broad scan across band for a radius microdisk with the fiber taper placed away from the disk edge and optimized for TM coupling. The spectrum was normalized to the response of the fiber taper moved laterally away from the disk edge. (b) High resolution scan of the mode at in (a). and indicate the CW/CCW mode splitting and individual mode linewidth, respectively. (c) Electric energy density plot and high resolution scan of a radius microdisk, showing the reduced loss of a bulk TE WGM.

Image of FIG. 3.
FIG. 3.

(Color online) (a)–(d) Wavelength scan of the doublet mode after each chemical treatment and accompanying schematic of chemical treatment. (a) As-processed, (b) triple piranha/HF cycle (Table I), (c) single piranha/HF/piranha step allowing measurement of piranha oxide, and (d) HF dip to remove chemical oxide from previous treatment and restore passivation. (e) Average intrinsic linewidth, , and average doublet splitting, , for all modes within the spectrum after each chemical treatment step.


Generic image for table
Table I.

Summary of piranha oxidation surface treatment.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Measuring the role of surface chemistry in silicon microphotonics