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Droplet-based photoresist deposition
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10.1063/1.2191087
/content/aip/journal/apl/88/14/10.1063/1.2191087
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2191087

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Geometry of a fluid loaded unit cell of a 2D micromachined ejector array.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Droplet diameter as a function of frequency. (b) Droplet velocity vs droplet spread on the silicon wafer surface.

Image of FIG. 3.
FIG. 3.

Three single photoresist droplet profiles on wafer.

Image of FIG. 4.
FIG. 4.

(Color online) (a) A single photoresist droplet, (b) two droplets overlapping by , and (c) two droplets overlapping by .

Image of FIG. 5.
FIG. 5.

Profiles of a single droplet and two droplets overlapping with varying distances of 25 and on a silicon wafer.

Image of FIG. 6.
FIG. 6.

(Color online) (a) A series of photoresist droplets printed periodically by drop on demand on a silicon wafer surface, (b) a photoresist line directly written on a silicon wafer by ejecting one droplet every , (c) full coverage of a wafer with photoresist without spinning, and (d) a small area on the coated wafer.

Tables

Generic image for table
Table I.

Data for the images shown in Fig. 4 for (a) a single photoresist droplet, (b) two droplets overlapping by , and (c) two droplets overlapping by .

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/content/aip/journal/apl/88/14/10.1063/1.2191087
2006-04-05
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Droplet-based photoresist deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2191087
10.1063/1.2191087
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