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Generating random surfaces with desired autocorrelation length
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10.1063/1.2191882
/content/aip/journal/apl/88/14/10.1063/1.2191882
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2191882
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Process sequence to achieve desired autocorrelation length using electrostatic deposition of particles and subsequent dry etching.

Image of FIG. 2.
FIG. 2.

AFM images (, vertical ) of final surfaces with (a) 15%, (b) 33%, and (c) 53% coverages of hillocks. (d) Details of a single hillock. Approximate width is (particle diameter) and height is about .

Image of FIG. 3.
FIG. 3.

Comparison of theoretical prediction from Eq. (3) (solid line) and experimental data (open circles) on silicon surfaces at a given particle size and etch depth.

Image of FIG. 4.
FIG. 4.

Autocorrelation length as a function of coverage and particle size as predicted by the model [Eq. (3)].

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/content/aip/journal/apl/88/14/10.1063/1.2191882
2006-04-03
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generating random surfaces with desired autocorrelation length
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2191882
10.1063/1.2191882
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