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Highly strain-relaxed ultrathin SiGe-on-insulator structure by Ge condensation process combined with irradiation and postannealing
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10.1063/1.2192644
/content/aip/journal/apl/88/14/10.1063/1.2192644
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2192644
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Sample structures for investigation of SGOI thickness dependence in oxidation induced Ge condensation process.

Image of FIG. 2.
FIG. 2.

Final SiGe thickness dependent relaxation rate of SGOI layers with identical Ge fraction (15%, 30%). Samples (A) were oxidized at 1100 or . Data for samples (B) oxidized at are shown by solid circles. The result obtained by the proposed improved method is also shown by a double circle.

Image of FIG. 3.
FIG. 3.

Influences of irradiation and postannealing on relaxation rate of SGOI layers with identical Ge fraction of 30% (SGOI thickness: ). Postannealing temperatures were (a) and (b) .

Image of FIG. 4.
FIG. 4.

Hydrogen irradiation dependent (0, , ) TEM picture of SGOI layers with identical Ge fraction of 30% (SGOI thickness: ). Results obtained before and after postannealing ( for ) are compared. Relaxation rate and defect density of SGOI layers are shown in the figures.

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/content/aip/journal/apl/88/14/10.1063/1.2192644
2006-04-04
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Highly strain-relaxed ultrathin SiGe-on-insulator structure by Ge condensation process combined with H+ irradiation and postannealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/14/10.1063/1.2192644
10.1063/1.2192644
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