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Gold surface with sub-nm roughness realized by evaporation on a molecular adhesion monolayer
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10.1063/1.2183820
/content/aip/journal/apl/88/15/10.1063/1.2183820
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2183820
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) A schematic diagram showing the chemical processes involved during silanization procedure [(a)–(d)] for the formation of a MPTMS (inset) monolayer over substrate, (a) plasma exposure, (b) hydroxylation, and (c) Si–O–Si covalent bond after exposure to MPTMS gaseous molecules inside a vacuum desiccator, and (d) a cartoon of the Au thin film e-beam evaporated on with MPTMS adhesive monolayer.

Image of FIG. 2.
FIG. 2.

(Color) AFM image of Au surface for (a) structure and (b) structure. (c) Plots of rms surface roughness vs scan area for representative samples from the two types of structures.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Transmittance FTIR spectroscopy of a SAM of 1-hexadecanethiol on the ultraflat Au surface, which shows a well ordered SAM. Inset in (a) shows the schematic of the molecule. (b) A representative current-voltage characteristics of nonane-dithiol in a M-M-M vertical device structure (microscopic image is shown in the inset).

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/content/aip/journal/apl/88/15/10.1063/1.2183820
2006-04-14
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Gold surface with sub-nm roughness realized by evaporation on a molecular adhesion monolayer
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2183820
10.1063/1.2183820
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