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Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
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10.1063/1.2194823
/content/aip/journal/apl/88/15/10.1063/1.2194823
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194823
/content/aip/journal/apl/88/15/10.1063/1.2194823
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/content/aip/journal/apl/88/15/10.1063/1.2194823
2006-04-12
2014-09-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194823
10.1063/1.2194823
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