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Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
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10.1063/1.2194823
/content/aip/journal/apl/88/15/10.1063/1.2194823
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194823
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the experimental setup.

Image of FIG. 2.
FIG. 2.

The single pass loss as a function of laser wavelength for and single and dual frequency (, ) discharges at . The estimated densities are and , irrespective of the presence of power.

Image of FIG. 3.
FIG. 3.

The single pass loss as a function of laser wavelength for an dual frequency (, ) discharge at . The estimated density is .

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/content/aip/journal/apl/88/15/10.1063/1.2194823
2006-04-12
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fluorine negative ion density measurement in a dual frequency capacitive plasma etch reactor by cavity ring-down spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194823
10.1063/1.2194823
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