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Impact of in situ carbon doping on implant damage and strain relaxation of epitaxial silicon germanium layer on silicon
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10.1063/1.2194893
/content/aip/journal/apl/88/15/10.1063/1.2194893
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194893
/content/aip/journal/apl/88/15/10.1063/1.2194893
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/content/aip/journal/apl/88/15/10.1063/1.2194893
2006-04-13
2014-08-01
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Scitation: Impact of in situ carbon doping on implant damage and strain relaxation of epitaxial silicon germanium layer on silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/15/10.1063/1.2194893
10.1063/1.2194893
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