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TEM micrograph of a thick film deposited at on a HF last surface of (100) Si.
(Color online) AFM scan of an thick film; the scan size is , the peak-to-valley value , and the RMS roughness .
High temperature XRD measurement of an thick film deposited on a HF last surface of (100) Si at .
(Color online) curves of films with different thicknesses; the inset shows a curve for the sample with a CET of recorded at .
(Color online) CET plots of sample series on HF last surface with different top contact metals. From the slope of the plots a value of can be derived.
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