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Cross-section HRTEM images of the CZO-O films (a) before and (b) after the RTA processing. (c)–(f) are the FFT and IFFT images of the selected nanocrystals indicated by arrows A and B in (b), respectively.
Cross-section HRTEM images of the CZO-N films after the RTA processing. The film remains amorphous with a clean interface.
core-level XPS spectra for the thick CZO-O film before (as deposited) and after the RTA processing.
XPS spectra of (a) and (b) core levels for the thick CZO-N film before (as deposited) and after the RTA processing.
(a) Capacitance density and (b) leakage current density as a function of voltage for capacitors with the CZO-N and CZO-O films, respectively. Both the films are thick and undertaken the RTA processing.
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