1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Interfacial properties of high- dielectric films deposited by pulsed laser deposition
Rent:
Rent this article for
USD
10.1063/1.2200750
/content/aip/journal/apl/88/18/10.1063/1.2200750
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/18/10.1063/1.2200750
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-section HRTEM images of the CZO-O films (a) before and (b) after the RTA processing. (c)–(f) are the FFT and IFFT images of the selected nanocrystals indicated by arrows A and B in (b), respectively.

Image of FIG. 2.
FIG. 2.

Cross-section HRTEM images of the CZO-N films after the RTA processing. The film remains amorphous with a clean interface.

Image of FIG. 3.
FIG. 3.

core-level XPS spectra for the thick CZO-O film before (as deposited) and after the RTA processing.

Image of FIG. 4.
FIG. 4.

XPS spectra of (a) and (b) core levels for the thick CZO-N film before (as deposited) and after the RTA processing.

Image of FIG. 5.
FIG. 5.

(a) Capacitance density and (b) leakage current density as a function of voltage for capacitors with the CZO-N and CZO-O films, respectively. Both the films are thick and undertaken the RTA processing.

Loading

Article metrics loading...

/content/aip/journal/apl/88/18/10.1063/1.2200750
2006-05-05
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interfacial properties of high-k dielectric CaZrOx films deposited by pulsed laser deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/18/10.1063/1.2200750
10.1063/1.2200750
SEARCH_EXPAND_ITEM