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Reducing the impurity incorporation from residual gas by ion bombardment during high vacuum magnetron sputtering
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10.1063/1.2193044
/content/aip/journal/apl/88/19/10.1063/1.2193044
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2193044
/content/aip/journal/apl/88/19/10.1063/1.2193044
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/content/aip/journal/apl/88/19/10.1063/1.2193044
2006-05-08
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reducing the impurity incorporation from residual gas by ion bombardment during high vacuum magnetron sputtering
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2193044
10.1063/1.2193044
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