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Schematic diagram of the apparatus used to perform microphotoluminescence spectroscopy and laser photolithography.
Schematic diagram of the QD registration process. A QD sample (a) is coated with a tungsten mask (b) and then SU-8 photoresist is spin-coated on (c). locates the QD (d) and an alignment marker is patterned in the SU-8 (e). Subsequent RIE forms the final tungsten marker (f).
(Color online) (a) Spatial intensity map of a QD exciton using excitation. The spectral integration was over a range centered at [see Fig. 4(a)] and the position step was . Also, optical microscope images of the registration pattern before (b) and after (c) reactive-ion etching showing the pattern in SU-8 and tungsten, respectively.
(a) Scan across one of the cross arms and the corresponding intensity profile, with the fitted curve shown as a dashed line. (b) QD spectra taken before (black line) and after (gray line) registration marker fabrication, with the spectra obtained at two excitation powers and the biexciton (XX) peak clearly visible.
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