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Effect of post deposition annealing on the optical properties of films
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10.1063/1.2202689
/content/aip/journal/apl/88/19/10.1063/1.2202689
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2202689

Figures

Image of FIG. 1.
FIG. 1.

N XPS spectra of films as-deposited and annealed at 500 and . The N peak decreased with the increase of annealing temperature indicates that nitrogen is replaced by oxygen during heat treatment process.

Image of FIG. 2.
FIG. 2.

The refractive index and the extinction coefficient as a function of photon energy for samples annealed at different temperatures. The refractive index increased as a function of annealing temperature while the extinction coefficient decreased.

Image of FIG. 3.
FIG. 3.

The real and imaginary parts of dielectric functions of films with different annealing temperatures based on the measured and the best-fitted spectra.

Image of FIG. 4.
FIG. 4.

The optical band gap which is determined by the energy dependence characteristic of indirect allowed transition as illustrated by the vs photon energy .

Tables

Generic image for table
Table I.

Parameter values of the fitting results from all samples using TL model dispersions.

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/content/aip/journal/apl/88/19/10.1063/1.2202689
2006-05-09
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of post deposition annealing on the optical properties of HfOxNy films
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2202689
10.1063/1.2202689
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