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Investigation of work function adjustments by electric dipole formation at the gate/oxide interface in preimplanted NiSi fully silicided metal gates
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10.1063/1.2203210
/content/aip/journal/apl/88/19/10.1063/1.2203210
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203210
/content/aip/journal/apl/88/19/10.1063/1.2203210
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/content/aip/journal/apl/88/19/10.1063/1.2203210
2006-05-12
2014-10-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of work function adjustments by electric dipole formation at the gate/oxide interface in preimplanted NiSi fully silicided metal gates
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203210
10.1063/1.2203210
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