1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Noncontact dielectric constant metrology of low- interconnect films using a near-field scanned microwave probe
Rent:
Rent this article for
USD
10.1063/1.2203238
/content/aip/journal/apl/88/19/10.1063/1.2203238
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203238
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Apparatus schematic and the lumped element scheme for the tip impedance in the case of a thin dielectric film on an arbitrary substrate. Tip-sample distance ; tip size .

Image of FIG. 2.
FIG. 2.

(a) 2D finite element model simulations of the normalized frequency shift for a -thick film on a metallic substrate at three tip-sample distances , 225, and . The tip geometry is shown in Fig. 1. It is evident that is linear (within simulation precision ) at . For these simulations . Solid lines are guides to the eye. (b) Typical experimental dependence for vs obtained on a set of six films, the parallel plate capacitor model , and the results of 2D simulation. The solid lines are guides to the eye. Note that in this graph is not absolute but is measured relative to , which was determined by extrapolating the experimental data to .

Image of FIG. 3.
FIG. 3.

(a) Correlation between NSMP and Hg probe measurements on log-log scale for a number of low- and high- films. The solid line is the linear fit with correlation coefficient . (b) Histogram based on 100 measurements performed at the same site on an -thick low- film. Mean -value is 3.237, with a standard deviation of 0.29%.

Loading

Article metrics loading...

/content/aip/journal/apl/88/19/10.1063/1.2203238
2006-05-09
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Noncontact dielectric constant metrology of low-k interconnect films using a near-field scanned microwave probe
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203238
10.1063/1.2203238
SEARCH_EXPAND_ITEM