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Noncontact dielectric constant metrology of low- interconnect films using a near-field scanned microwave probe
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10.1063/1.2203238
/content/aip/journal/apl/88/19/10.1063/1.2203238
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203238
/content/aip/journal/apl/88/19/10.1063/1.2203238
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/content/aip/journal/apl/88/19/10.1063/1.2203238
2006-05-09
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Noncontact dielectric constant metrology of low-k interconnect films using a near-field scanned microwave probe
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/19/10.1063/1.2203238
10.1063/1.2203238
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