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Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids
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View: Figures


Image of FIG. 1.
FIG. 1.

The side-view SEM images of the axial cross section of the void recorded in viosil silica by single pulses of 40 (a) and (b) at wavelength and duration. The lateral radius where shock wave stopped is (densified region); is the lateral void diameter. The top-down arrows mark the direction of irradiation. Pulse energy is given at the focus; the threshold of optically observable damage was . (c) The phase-contrast Nomarski image showing enhanced etching rate along the line of bits formed by a single-pulse dielectric breakdown (see text for details).

Image of FIG. 2.
FIG. 2.

(Color online) Dependence of the void’s lateral diameter , diameter of shock-affected region , and diameter of channel wet etched in 5% aqueous solution of HF, , on pulse energy . Dashed area depicts conditions when cracks were observed around the void before cleaving. Theoretical fit dependencies (1,2) were calculated by Eqs. (1) and (2) respectively, with . Gray area depicts the densified region surrounding the void.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids