Full text loading...
Basic concept of (a) the previous aperture array and (b) the microlens illuminated aperture array.
Fabrication process of the microlens illuminated aperture array: (a) fabrication process for the aperture array, (b) fabrication process for the mold for the microlens array, and (c) replication of the microlens array on the aperture array.
Simulated light intensity profiles (a) from the surface of the designed microlens array in the direction of optical axis (focal length is and depth of focus is ) and (b) at the focal position of the microlens array [FWHM spot size is , plane in (a)].
The normalized energy passing through aperture hole as a function of (a) longitudinal and (b) lateral misalignments.
SEM images of (a) the fabricated aperture array and (b) the UV-imprinted microlens array (aperture diameter is , sag height of microlens is , period is , and array dimension is ).
Measured intensity profiles of the optical probes at Talbot position using (a) an aperture array (maximum intensity is and FWHM spot size is ) and (b) the microlens illuminated aperture array (maximum intensity is and FWHM spot size is ).
Article metrics loading...