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The sequence of CNF transferring to substrate and subsequent patterning by plasma etching. (a) CNF on MCE filter after vacuum filtration; (b) CNF with MCE filter being transferred onto silicon substrate; (c) MCE filter dissolved; (d) spin coating photoresist; (e) photolithography; (f) plasma etching of CNF; (g) masking photoresist removed; and (h) in the case of CNF/SU8 actuator, etching was used to release the actuator structure.
(a) A semitransparent CNF of covered on silicon wafer; (b) scanning electron microscopy (SEM) image of CNF lines in width fabricated by oxygen plasma etching; (c) higher magnification image of patterns in (b); and (d) clear patterns of CNF lines with spacing. Insert: Sharp pattern edge formed by nanotube cutting in plasma. Scale bars: (a) , [(b) and (c)] , (d) , and insert in (d), .
(a) SEM image of released CNF/SU8 actuators. Insert: SEM image of a actuator arrays. (b) SEM image of the squared region in (a) showing the bilayer cross section of the actuator.
The displacement of the CNF/SU8 actuator as a function of the laser intensity. Insert: Cross-sectional view of actuation under laser light stimulus. Straight lines were drawn for eye guidance.
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