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Noncontact electrical metrology of Cu/low- interconnect for semiconductor production wafers
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10.1063/1.2216898
/content/aip/journal/apl/88/26/10.1063/1.2216898
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/26/10.1063/1.2216898
/content/aip/journal/apl/88/26/10.1063/1.2216898
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/content/aip/journal/apl/88/26/10.1063/1.2216898
2006-06-26
2014-07-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Noncontact electrical metrology of Cu/low-k interconnect for semiconductor production wafers
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/26/10.1063/1.2216898
10.1063/1.2216898
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