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Alternative precursor metal-organic chemical vapor deposition of quantum dot laser diodes with ultralow threshold at
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10.1063/1.2218059
/content/aip/journal/apl/88/26/10.1063/1.2218059
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/26/10.1063/1.2218059
/content/aip/journal/apl/88/26/10.1063/1.2218059
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/content/aip/journal/apl/88/26/10.1063/1.2218059
2006-06-28
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Alternative precursor metal-organic chemical vapor deposition of InGaAs∕GaAs quantum dot laser diodes with ultralow threshold at 1.25μm
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/26/10.1063/1.2218059
10.1063/1.2218059
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