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Nucleation of atomic-layer-deposited films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation
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10.1063/1.2164417
/content/aip/journal/apl/88/3/10.1063/1.2164417
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2164417

Figures

Image of FIG. 1.
FIG. 1.

Small angle scattering intensity curves, per unit area, for selected samples, showing enhanced scattering from grown on H-term Si. Azimuthal angle range is 45°–60°, and grazing incidence angle is 0.35°. Solid curves show excellent fits to the data.

Image of FIG. 2.
FIG. 2.

Scattering feature size distributions, per unit area, for selected samples: (a) 1, 25, and 60 cycle samples grown on Chemox Si and (b) 5, 20, and 80 cycle samples grown on H-term Si.

Image of FIG. 3.
FIG. 3.

Volume of scattering features per film area, normalized to the 25 cycle film grown on Chemox Si, as a function of layer thickness.

Image of FIG. 4.
FIG. 4.

Comparison of layer thickness determined from reflectivity curves and RBS measurements, for layers grown on (a) Chemox Si and (b) H-term Si. The curves are guides for the eye.

Tables

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Table I.

films used in this study.

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/content/aip/journal/apl/88/3/10.1063/1.2164417
2006-01-20
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nucleation of atomic-layer-deposited HfO2 films, and evolution of their microstructure, studied by grazing incidence small angle x-ray scattering using synchrotron radiation
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2164417
10.1063/1.2164417
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