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Band alignment between (100) Si and amorphous , , and : Atomically abrupt versus interlayer-containing interfaces
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10.1063/1.2164432
/content/aip/journal/apl/88/3/10.1063/1.2164432
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2164432
/content/aip/journal/apl/88/3/10.1063/1.2164432
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/content/aip/journal/apl/88/3/10.1063/1.2164432
2006-01-18
2014-07-11
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Band alignment between (100) Si and amorphous LaAlO3, LaScO3, and Sc2O3: Atomically abrupt versus interlayer-containing interfaces
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2164432
10.1063/1.2164432
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