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(a) and (b) Bright-field TEM images of cBN films prepared under different conditions for ion milling, (c) and (d) high-resolution TEM images taken from the surface areas of the samples shown in (a) and (b).
Schematic diagrams showing the steps for preparing the cross-sectional TEM sample of the BN film with the introduction a thin Au coating.
A typical bright-field TEM image and the corresponding SAED pattern (insert) of the BN film deposited by magnetron sputtering.
High-resolution TEM images of the surfaces of the cBN films deposited by (a)–(c) magnetron sputtering, and (d) ECR MPCVD.
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