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One keV ion scattering spectrum of a H-terminated Si(211) surface.
Thermodesorption spectrum of a H-terminated Si(211) surface formed with a HF spin drip process.
(Color) One keV ion scattering spectrum during H removal from a H-terminated surface. The inset represents and vs time for F and Si; where is the measured intensity, is the initial intensity and is the final intensity of the secondary ion yields.
XPS spectrum of a cleaned H-terminated Si(211) surface with (a) thermal desorption, (b) ions, and (c) ions.
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