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Real-time monitoring of plasma oxidation dynamics of subnanometer barriers for magnetic tunnel junctions
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10.1063/1.2166696
/content/aip/journal/apl/88/3/10.1063/1.2166696
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2166696
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Ellipsometry measurements of the plasma oxidation for samples with Al grown on CoFe (a). Oxidation rate of the samples with Al layers on (b). The curves are polynomial fits used to determine the start of the CoFe oxidation , with an index number indicating the Al thickness in Å.

Image of FIG. 2.
FIG. 2.

Onset of the CoFe oxidation as a function of the deposited Al thickness. The dashed lines indicate the times at which XPS measurements are performed.

Image of FIG. 3.
FIG. 3.

(Color online) Co XPS spectra for samples with deposited Al after (a) and (b) oxidation. As a reference also the spectrum of an unoxidized sample is plotted. The arrow indicates the position of the shake-up peak.

Image of FIG. 4.
FIG. 4.

(Color online) CoO thickness after oxidation, determined from the ellipsometry measurements, vs the amount of CoO that was determined from the XPS data of oxidation. The inset shows how the amount of CoO, is determined from the ellipsometry measurements of the Al sample.

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/content/aip/journal/apl/88/3/10.1063/1.2166696
2006-01-19
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Real-time monitoring of plasma oxidation dynamics of subnanometer Al2O3 barriers for magnetic tunnel junctions
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/3/10.1063/1.2166696
10.1063/1.2166696
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