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Time-resolved measurements of density in high-density plasmas and application
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10.1063/1.2171768
/content/aip/journal/apl/88/5/10.1063/1.2171768
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/5/10.1063/1.2171768
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic of the experimental setup.

Image of FIG. 2.
FIG. 2.

Time variation of signals and (in volts) and the ratio in an empty reactor.

Image of FIG. 3.
FIG. 3.

Time evolution of the density in a pure plasma without wafer. Plasma conditions are 50 sccm flow rate, 68 mTorr pressure, and 700 W source power. Solid lines before point (1) and between points (5) and (6) are the calculation results for the reactor filling with .

Image of FIG. 4.
FIG. 4.

Source rf power dependence of the density in both clean reactor and in a SiOCl-coated reactor. Plasma conditions: 50 sccm flow rate, 20 mTorr pressure, no bias power, and no wafer.

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/content/aip/journal/apl/88/5/10.1063/1.2171768
2006-02-03
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Time-resolved measurements of Cl2 density in high-density plasmas and application
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/5/10.1063/1.2171768
10.1063/1.2171768
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