Full text loading...
Schematic of the experimental setup.
Time variation of signals and (in volts) and the ratio in an empty reactor.
Time evolution of the density in a pure plasma without wafer. Plasma conditions are 50 sccm flow rate, 68 mTorr pressure, and 700 W source power. Solid lines before point (1) and between points (5) and (6) are the calculation results for the reactor filling with .
Source rf power dependence of the density in both clean reactor and in a SiOCl-coated reactor. Plasma conditions: 50 sccm flow rate, 20 mTorr pressure, no bias power, and no wafer.
Article metrics loading...