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RHEED patterns in the  direction of the sample with (a) of the STO substrate before deposition, (b) after deposition of the LSMO layer, and (c) after deposition of the BFO. The pattern is more diffuse in (b) because the pressure of measurement was compared to for (a) and (c). (d) X-ray diffraction spectra of BFO/LSMO//STO bilayers with and and 70nm. S, L, and B label peaks of STO, LSMO, and BFO, respectively. (e) RSM of the (103) reflections of the BFO (70 nm)/LSMO//STO bilayer; r.l.u. is for reciprocal space units.
(a) Magnetic hysteresis loops of the BFO/LSMO//STO bilayer with measured by SQUID at 10 K. (b) Temperature dependence of the magnetization in a field of 1kOe, normalized to the magnetization at 10 K for the same sample.
morphology (a) and resistance (b) maps of the BFO(5 nm)/LSMO bilayer measured simultaneously by a CTAFM. (c) Logarithm of the average resistance of these maps for different BFO thicknesses. The error bars correspond to the full width at half maximum of the resistance distribution.
Topography (a) and PFM image (b) after writing stripe domains using the AFM tip as a top electrode of the 5nm BFO layer. PFM image (c) after writing two wider stripes perpendicularly to the pattern seen in (b).
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