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(Color online) Cross-sectional TEM micrographs of electrodeposited nanocrystalline Ni from Goodfellow, with a grain size of 30–50 nm. There is an elongated grain structure along the thickness direction with an aspect ratio of about 2.5. The amorphous like structure seen in low right corner is the platinum coating applied to protect the surface of TEM samples during FIB processing.
(Color online) (a) An Ambios white-light profilometry image of the nanocrystalline nickel surface after loading at 20 GPa. (b) Cross-sectional HRTEM image of the amorphous layer at the shock surface of the nc nickel.
(Color online) Cross-sectional TEM images of nc nickel after shock loading at (a) 20 GPa, and (b) 40 GPa, showing dislocation activity. The inset in (b) is a dark-field TEM image corresponding to the white square area, in which dislocations are better resolved.
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