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Length-scale dependence of the step bunch self-organization on patterned vicinal surfaces
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10.1063/1.2175501
/content/aip/journal/apl/88/7/10.1063/1.2175501
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/7/10.1063/1.2175501
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

High pass filtered AFM images of topography resulting from annealing patterned vicinal surfaces at in ultrahigh vacuum for . Initial pattern dimensions are (a) pitch, (b) pitch (center) and (c) pitch. Initial pit depths are approximately . Here and in Fig. 2, the field of view is , and steps ascend toward the left (uphill direction).

Image of FIG. 2.
FIG. 2.

High pass filtered AFM images of topography after annealing patterned vicinal surfaces at in ultrahigh vacuum at a series of progressively longer times. Initial pattern dimensions are diameter, pitch. Annealing times (a) , (b) , (c) .

Image of FIG. 3.
FIG. 3.

Relaxation of the corrugation amplitudes measured in (solid circles) and out (open squares) of the plane of the nominal surface for patterns of initial dimensions: (a) center-center spacing, and (b) diameter, spacing. Open diamonds show the corrugation amplitude out of plane measured midway between rows of cylindrical pits.

Image of FIG. 4.
FIG. 4.

Summary of time constants for decay of in-plane (solid circle) and out-of-plane (open squares) corrugation amplitudes as a function of initial pit diameter. Dashed line shows a best fit to a power law dependence for the in-plane relaxation time, with an exponent of .

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/content/aip/journal/apl/88/7/10.1063/1.2175501
2006-02-15
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Length-scale dependence of the step bunch self-organization on patterned vicinal Si(111) surfaces
http://aip.metastore.ingenta.com/content/aip/journal/apl/88/7/10.1063/1.2175501
10.1063/1.2175501
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