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Diamond photonic band gap synthesis by umbrella holographic lithography
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10.1063/1.2347112
/content/aip/journal/apl/89/10/10.1063/1.2347112
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/10/10.1063/1.2347112
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Figures

Image of FIG. 1.
FIG. 1.

Umbrella setup: The polarization of each beam is defined with the help of the orthonormal vectors and the angle made by the polarization vector with . , , and are mutually perpendicular and —whose corresponding sector is highlighted—is measured in a clockwise direction from when is the direction of the eyesight. The figure illustrates the beam configuration required by the optimized setup: , , and the angle between side and central beams of .

Image of FIG. 2.
FIG. 2.

Band structure of the PC obtained after the exposure of the optimized pattern, Eq. (4), with a scaled threshold, defined as , of . The high intensity region has a dielectric constant of and a filling fraction of . The low intensity region has . The full PBG has a relative width of 25.2% and is centered at where is the tetragonal lattice constant in the plane. The inset shows the variation of the PBG size with the volume fraction of the solid component. The gap remains open for solid filling fractions from 8% to 67% while the scaled threshold varies from to . The gap is greater than 20% for filling fractions from 13% to 36%.

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/content/aip/journal/apl/89/10/10.1063/1.2347112
2006-09-07
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Diamond photonic band gap synthesis by umbrella holographic lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/10/10.1063/1.2347112
10.1063/1.2347112
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