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Silica nanomachining using laser plasma soft x rays
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10.1063/1.2347117
/content/aip/journal/apl/89/10/10.1063/1.2347117
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/10/10.1063/1.2347117
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Figures

Image of FIG. 1.
FIG. 1.

(a) Experimental setup for silica nanomachining using LPSXs. (b) SEM image of a line-and-space contact mask fabricated on a silica plate . (c) Silica glass plate after irradiation with LPSXs and removal of the contact mask.

Image of FIG. 2.
FIG. 2.

Cross-sectional SEM images of trenches fabricated by LPSX irradiation (a) at low fluence for 70 shots and (b) at high fluence for a single shot.

Image of FIG. 3.
FIG. 3.

Ablation rate (open circles) of silica glass by LPSX irradiation in Ar gas. The inset shows transmittance spectra of Ar gas at 5 and . Curves (a), (b), and (c) show transmittance of Ar gas at 10, 20, and , respectively, as a function of Ar gas pressure.

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/content/aip/journal/apl/89/10/10.1063/1.2347117
2006-09-07
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silica nanomachining using laser plasma soft x rays
http://aip.metastore.ingenta.com/content/aip/journal/apl/89/10/10.1063/1.2347117
10.1063/1.2347117
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