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(a) Experimental setup for silica nanomachining using LPSXs. (b) SEM image of a line-and-space contact mask fabricated on a silica plate . (c) Silica glass plate after irradiation with LPSXs and removal of the contact mask.
Cross-sectional SEM images of trenches fabricated by LPSX irradiation (a) at low fluence for 70 shots and (b) at high fluence for a single shot.
Ablation rate (open circles) of silica glass by LPSX irradiation in Ar gas. The inset shows transmittance spectra of Ar gas at 5 and . Curves (a), (b), and (c) show transmittance of Ar gas at 10, 20, and , respectively, as a function of Ar gas pressure.
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